Characterization and Application of DLC Films Produced by New Combined PVD-CVD Technique

초록

A new advanced combined PVD/CVD technique of DLC film deposition has been developed. Deposition of a DLC film was carried out using a pulsed carbon arc discharge in vapor hydrocarbon atmosphere. The arc plasma enhancing CVD process promotes dramatic increase in the deposition rate and decrease of compressive stress as well as improvement of film thickness uniformity com-pared to that obtained with a single PVD pulsed arc process. The optical spectroscopy investigation reveals great increase in radiating components of C2 Swan system molecular bands due to acetylene molecules decomposition. AFM, Raman spectroscopy, XPS and nano-indentation were used to cha-racterize DLC films. The method ensures obtaining a new superhard DLC nano-material for deposi-tion of protective coatings onto various industrial products including those used in medicine.

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