Simultaneous Submicron Temperature Mapping of Substrate and Channel in P-GaN/AlGaN/GaN HEMTs Using Raman Thermometry

초록

In this study, we introduce a high-resolution, high-speed thermal imaging technique using Raman spectroscopy to simultaneously measure the temperature of a substrate and a channel. By modifying the Raman spectrometer, we achieved a measurement speed faster than commercial spectrometers. This system demonstrated a sub-micron spatial resolution and the ability to measure the temperatures of the Si substrate and GaN channel simultaneously. During high-current operation, we observed significant self-heating in the GaN channel, with hotspots 100 degrees C higher than the surroundings, while the Si substrate showed an even temperature distribution. The ability to detect hotspots can help secure the reliability of devices through early failure analysis and can also be used for improvement research to reduce hotspots. These findings highlight the potential of this technique for early defect inspection and device improvement research. This study provides a novel and effective method for measuring the sub-micron resolution temperature distribution in devices, which can be applied to various semiconductor devices, including SiC-based power devices.

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