Surface modified solution-derived lanthanum-doped zinc oxide film for nematic liquid crystal system with free residual DC voltage

  • Lee, Ju Hwan
  • Kim, Eun-Mi
  • Heo, Gi-Seok
  • Jeong, Hae-Chang
  • Kim, Dong Hyun
  • ... Kim, Tae Wan
  • 외 3명
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초록

The liquid crystal (LC) alignment characteristics of the solution-derived lanthanum-doped zinc oxide (La:ZnO) film with ion-beam (IB) irradiation were investigated as a function of curing temperature. The best LC alignment state with uniform and homogeneous alignment was achieved at a curing temperature of 300 degrees C. To observe the effect of the IB irradiation on the La:ZnO film, physical and chemical surface analyses were conducted. Atomic-force microscopy revealed that surface roughness was increased, and the leptokurtic surface was changed to a platykurtic surface after the IB irradiation. X-ray photoelectron spectroscopy showed the breakage of the metal-oxide bonds, which induced an increase of oxygen vacancies. This caused van der Waals force, which strongly anchored LC molecules to the La:ZnO film. These results indicated that uniform and homogeneous LC alignment with the solution-derived La:ZnO films was induced by physical and chemical surface modification due to the IB irradiation. Moreover, residual DC was characterized by a capacitance-voltage hysteresis curve and nearly zero hysteresis was achieved. Therefore, IB irradiation is a useful method to achieve uniform and homogenous LC alignment, and using it with the solution-derived La:ZnO film exhibited potential for high-quality LC applications. (C) 2018 Elsevier B.V. All rights reserved.

키워드

Ion-beam irradiationSolution processingLanthanum-doped zinc oxideSurface modificationCapacitance-voltage hysteresisALIGNMENTLAYERS
제목
Surface modified solution-derived lanthanum-doped zinc oxide film for nematic liquid crystal system with free residual DC voltage
저자
Lee, Ju HwanKim, Eun-MiHeo, Gi-SeokJeong, Hae-ChangKim, Dong HyunLee, Dong WookHan, Jeong-MinKim, Tae WanSeo, Dae-Shik
DOI
10.1016/j.matchemphys.2018.04.023
발행일
2018-07-01
유형
Article
저널명
Materials Chemistry and Physics
213
페이지
383 ~ 388