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Impact ionization coefficients in 4H-SiC
- Loh, W. S.;
- Ng, B. K.;
- Ng, J. S.;
- Soloviev, Stanislav I.;
- Cha, Ho-Young;
- 외 3명
WEB OF SCIENCE
80SCOPUS
86초록
Photomultiplication measurements using 244- and 325-nm excitation have been undertaken on a series of thick 4H-SiC avalanche diodes. With avalanche widths of between 2.7 and 6 mu m and the ability to measure multiplication as low as 1.001, a much wider electric field range has been covered than reported to date. The results show that the hole ionization coefficient (beta) can be obtained with a high degree of accuracy down to electric fields as low as similar to 0.9 MV/cm. The value of electron ionization coefficient (a) has been determined from mixed carrier multiplication characteristics, and the beta/alpha ratio is found to increase significantly with decreasing electric fields. Ionization coefficients are parameterized over the electric field range from 0.9 to 5 MV/cm, enabling the multiplication and breakdown characteristics of 4H-SiC to be predicted accurately.
키워드
- 제목
- Impact ionization coefficients in 4H-SiC
- 저자
- Loh, W. S.; Ng, B. K.; Ng, J. S.; Soloviev, Stanislav I.; Cha, Ho-Young; Sandvik, Peter M.; Johnson, C. Mark; David, John P. R.
- 발행일
- 2008-08
- 유형
- Article
- 권
- 55
- 호
- 8
- 페이지
- 1984 ~ 1990
- 언어
- ENG
- 출판사
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
- 발행국가
- 미국
- 분량
- 7 페이지
- ISSN
- E 1557-9646
P 0018-9383