한국정보기술학회논문지

ISSN
P 1598-8619 E 2093-7571
출판사
한국정보기술학회
국가
SOUTH KOREA
발행 상태
비활성

데이터베이스 수록 정보

KCI 2009-2025 (17년)
KCI 등재 2009-2026 (18년)
KCI 등재후보 2006-2008 (3년)

전체 24건 중 1번부터 10번까지의 결과를 표시합니다.

2025
Article

Enhanced temperature stability of dielectric permittivity and energy storage properties of BNT-based lead-free relaxor ceramics

  • Yadav, Arun Kumar
  • Yoo, Il-Ryeol
  • Choi, Seong-Hui
  • Park, Je-Yeon
  • Kim, Min-Seok
  • ... Cho, Jiung
  • 외 2명
  • 2025-04
  • Ceramics International
  • Elsevier Ltd
2024
Article

Structural control in atomic layer deposited hafnium oxide thin films through vertical cavity surface-emitting laser (VCSEL)-Based ultra-rapid heating

  • 2024-11-01
  • Ceramics International
  • ELSEVIER SCI LTD
2021
Article

Synthesis, morphology, characterisation, and ethanol gas sensing of hierarchical flower-like Co-doped WO3 nanoplates by solvothermal route

  • Lim, J.-C.
  • Jin, C.
  • Choi, M.S.
  • Kim, M.Y.
  • Kim, S.-I.
  • 외 4명
  • 2021-08-01
  • Ceramics International
  • Elsevier Ltd
2020
Article

Tin oxysulfide composite thin films based on atomic layer deposition of tin sulfide and tin oxide using Sn(dmamp)(2) as Sn precursor

  • Choi, Jeong-Wan
  • Oh, Jiwon
  • Tran Thi Ngoc Van
  • Kim, Jaehwan
  • Hwang, Heesu
  • ... Hwang, Jin-Ha
  • 외 4명
  • 2020-03
  • Ceramics International
  • ELSEVIER SCI LTD
2019
Article

Moisture barrier properties of low-temperature atomic layer deposited Al2O3 using various oxidants

  • Nam, Taewook
  • Lee, Haksoo
  • Seo, Seunggi
  • Cho, Sung Min
  • Shong, Bonggeun
  • 외 2명
  • 2019-10-15
  • Ceramics International
  • ELSEVIER SCI LTD
Article

Systematic design of hierarchical Ni3S2/MoO2 nanostructures grown on 3D conductive substrate for high-performance pseudocapacitors

  • Lee, Young-Woo
  • Kim, Min-Cheol
  • Quoc Hung Nguyen
  • Ahn, Wook
  • Jung, Jae-Eun
  • 외 2명
  • 2019-02-01
  • Ceramics International
  • ELSEVIER SCI LTD
2018
Article

Low temperature atomic layer deposition of nickel sulfide and nickel oxide thin films using Ni(dmamb)(2) as Ni precursor

  • 2018-10-01
  • Ceramics International
  • ELSEVIER SCI LTD
Article

Physical/chemical characterization of amorphous indium-gallium-zinc-oxynitride thin film transistors

  • 2018-06-15
  • Ceramics International
  • ELSEVIER SCI LTD
Article

Robust SiO2 gate dielectric thin films prepared through plasma-enhanced atomic layer deposition involving di-sopropylamino silane (DIPAS) and oxygen plasma: Application to amorphous oxide thin film transistors

  • 2018-02-01
  • Ceramics International
  • ELSEVIER SCI LTD
2016
1